Atmospheric Pressure CVD Equipment "AMAX800V"
Excellent uniformity of film thickness and impurity concentration. Atmospheric pressure CVD equipment that achieves high productivity and low cost.
The atmospheric pressure CVD device "AMAX800V" is a continuous atmospheric pressure CVD system compatible with φ200mm wafers, utilizing the reaction characteristics of monosilane gas to form insulating films such as USG, PSG, BPSG, and back surface protective films on silicon substrates. It achieves high throughput through improvements in the transport mechanism. The adoption of SiC trays minimizes heavy metal contamination, and stable process performance is achieved with less thermal aging. 【Features】 ○ High throughput ○ Excellent film formation characteristics ○ Maintenance-friendly ○ Reduced metal contamination (optional) For more details, please contact us or download the catalog.
- Company：天谷製作所
- Price：Other
